Investigating the thermal stability of the chemical vapour deposited zirconium carbide layers

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dc.contributor.authorBiira, Saphina
dc.contributor.authorThabethe, T.T.
dc.contributor.authorHlatshwayo, T.T.
dc.contributor.authorBissett, H.
dc.contributor.authorNtsoane, T.
dc.contributor.authorMalherbe, J.B.
dc.date.accessioned2023-04-01T17:32:47Z
dc.date.available2023-04-01T17:32:47Z
dc.date.issued2020
dc.description.abstractThe effect of thermal treatment on zirconium carbide (ZrC) layers deposited by chemical vapour deposition process was investigated using X-ray diffraction (XRD), Raman spectroscopy, nanoindention and scanning electron microscopy (SEM). The ZrC layers deposited at 1400 C (composed of 96% ZrC and 4% C) were annealed at 1500, 1600, 1700 and 1800 C for 2 h under high vacuum of 2.6 10 7 mbar. After annealing, the lattice constant and the average crystallite sizes were found to increase whereas the lattice strain and dislocation density decreased. The preferred orientation of the as-deposited layers was (220); it changed to (200) when annealed at 1500 C and 1600 C. At annealing temperature of 1700 C and 1800 C, the preferred orientation was (220) just like for the as-deposited ZrC layers. From Raman spectroscopy analysis, the ID/IG ratio reduced from 0.694 to 0.414 with annealing temperature indicating an improvement in crystallinity level and a decrease in the defects in the carbon material in the ZrC layers. The hardness of the layers was found to decrease slightly with annealing temperature from 26.4 ± 0.6 GPa to 21.3 ± 0.5 GPa. Some voids initially present in the as-deposited ZrC layers closed up and particles increased in size with annealing temperature.en_US
dc.identifier.citationBiira, S., Thabethe, T. T., Hlatshwayo, T. T., Bissett, H., Ntsoane, T., & Malherbe, J. B. (2020). Investigating the thermal stability of the chemical vapour deposited zirconium carbide layers. Journal of Alloys and Compounds, 834, 155003. https://doi.org/10.1016/j.jallcom.2020.155003en_US
dc.identifier.urihttps://doi.org/10.1016/j.jallcom.2020.155003
dc.identifier.urihttps://nru.uncst.go.ug/handle/123456789/8382
dc.language.isoenen_US
dc.publisherJournal of Alloys and Compoundsen_US
dc.subjectAnnealing temperatureen_US
dc.subjectChemical vapour depositionen_US
dc.subjectZrC layersen_US
dc.subjectMicrostructural propertiesen_US
dc.subjectSurface morphologyen_US
dc.titleInvestigating the thermal stability of the chemical vapour deposited zirconium carbide layersen_US
dc.typeArticleen_US
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