Effect of the ZrCl4 static vaporiser system and deposition time on growth characteristics of chemical vapour deposited zirconium carbide layers

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dc.contributor.authorBiira, Saphina
dc.contributor.authorHlatshwayo, Thulani T.
dc.contributor.authorCrouse, Philip L.
dc.contributor.authorBissett, Hertzog
dc.contributor.authorThabethe, Thabsile T.
dc.contributor.authorMlambo, Mbuso
dc.contributor.authorMalherbe, Johan B.
dc.date.accessioned2023-04-01T16:27:27Z
dc.date.available2023-04-01T16:27:27Z
dc.date.issued2019
dc.description.abstractZrC layers were deposited from ZrCl4– Ar–CH4–H2 gas mixture in a home-built vertical wall chemical vapour deposition system within the deposition time range 0.5–2.5 h. The flow behaviour of ZrCl4 from the static vaporiser system to reaction chamber as a function of time was studied. To investigate the microstructure evolution and the growth characteristics of ZrC layers with deposition time, the growth rate, microstructure, morphology and composition were analysed. The layer thickness increased with deposition time all through; however, its growth rate increased up to 1.0 h and thereafter declined. The X-ray diffraction (XRD) analysis showed both ZrC and carbon peaks. The intensity of the carbon peaks followed a non-linear trend with deposition time. The average crystallite size and the number of crystallites per unit volume of the layers increased with deposition time. The orientation of crystallographic plane also varied with the deposition time. At short deposition times, the Raman spectra showed the acoustic and optic branches indicating that the ZrC deposited contained carbon vacancies. The D and G peaks of carbon increased as the deposition time increased, an indication of free carbon in the deposited layers. At short deposition times, the surface morphology of the layers was relatively flat and smooth. The particle size and agglomerations also increased with time.en_US
dc.identifier.citationBiira, S., Hlatshwayo, T. T., Crouse, P. L., Bissett, H., Thabethe, T. T., Mlambo, M., & Malherbe, J. B. (2019). Effect of the ZrCl 4 static vaporiser system and deposition time on growth characteristics of chemical vapour deposited zirconium carbide layers. Applied Physics A, 125, 1-9. https://doi.org/10.1007/s00339-019-2490-3en_US
dc.identifier.urihttps://doi.org/10.1007/s00339-019-2490-3
dc.identifier.urihttps://nru.uncst.go.ug/handle/123456789/8373
dc.language.isoenen_US
dc.publisherApplied Physics Aen_US
dc.subjectZrCl4 static vaporiser systemen_US
dc.subjectGrowthen_US
dc.subjectChemical vapouren_US
dc.subjectZirconium carbide layersen_US
dc.titleEffect of the ZrCl4 static vaporiser system and deposition time on growth characteristics of chemical vapour deposited zirconium carbide layersen_US
dc.typeArticleen_US
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