Efavirenz- but not nevirapine-based antiretroviral therapy decreases exposure to the levonorgestrel released from a sub-dermal contraceptive implant

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dc.contributor.authorKimberly, Scarsi
dc.contributor.authorLamorde, Mohammed
dc.contributor.authorDarin, Kristin
dc.contributor.authorDilly Penchala, Sujan
dc.contributor.authorElse, Laura
dc.contributor.authorNakalema, Shadia
dc.contributor.authorByakika-Kibwika, Pauline
dc.contributor.authorKhoo, Saye
dc.contributor.authorCohn, Susan
dc.contributor.authorMerry, Concepta
dc.contributor.authorBack, David
dc.date.accessioned2022-01-12T10:19:05Z
dc.date.available2022-01-12T10:19:05Z
dc.date.issued2014
dc.description.abstractSub-dermal hormone implants, such as levonorgestrel (LNG), are a safe and desirable form of long-acting contraception, but their use among HIV-positive women on antiretroviral therapy (ART) may be compromised given the potential for a cytochrome P450 3A-mediated drug-drug interaction. Our study aimed to characterize the pharmacokinetics of LNG released from a sub-dermal implant over six months in HIV-positive Ugandan women on nevirapine (NVP)- or efavirenz (EFV)-based ART.en_US
dc.identifier.citationScarsi, K., Lamorde, M., Darin, K., Dilly Penchala, S., Else, L., Nakalema, S., ... & Back, D. (2014). Efavirenz‐but not nevirapine‐based antiretroviral therapy decreases exposure to the levonorgestrel released from a sub‐dermal contraceptive implant. Journal of the International AIDS Society, 17, 19484. http://dx.doi.org/10.7448/IAS.17.4.19484en_US
dc.identifier.urihttp://dx.doi.org/10.7448/IAS.17.4.19484
dc.identifier.urihttps://nru.uncst.go.ug/xmlui/handle/123456789/1214
dc.language.isoenen_US
dc.publisherJournal of the International AIDS Societyen_US
dc.subjectEfavirenzen_US
dc.subjectNevirapine-based antiretroviral therapyen_US
dc.subjectLevonorgestrelen_US
dc.subjectSub-dermal contraceptive implanten_US
dc.titleEfavirenz- but not nevirapine-based antiretroviral therapy decreases exposure to the levonorgestrel released from a sub-dermal contraceptive implanten_US
dc.typeArticleen_US
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